People are always asking “What should I expect when I start designing at 20nm using double patterning?” It’s a good question, but in many real aspects, the answer is “It depends,” and that is not very ...

The challenges of double pattering (DP)-based design are looming large to those customers starting to move to the 20 nm technology node. Of course, much of the fear and trepidation is simply due to it ...

SAN FRANCISCO — Amid probable delays for extreme ultraviolet (EUV) lithography, ASML, Canon and Nikon are updating their roadmaps, racing each other to capitalize on the shift towards ...

TSMC is planning to adopt double patterning extensively at 20nm, despite the high cost of doing so. Why? Because EUV hasn't come through. Share on Facebook (opens in a new window) Share on X (opens in ...

According to Applied Materials, it is. As 32 nm technologies ramp within the next two years, the extension of optical lithography to meet patterning requirements is the industry’s most urgent ...

Cadence Design Systems is targeting designs for the 20nm process node with its latest tools in the Virtuoso suite. Called Virtuoso Advanced Node, the mixed signal chip design tool addresses 20nm ...