Several lithographic techniques are used for patterning in the nanoscale region. This article examines nanoimprint lithography (NIL), an emerging process that can produce sub-10nm features Nanoimprint ...
On April 18, 2024, Intel announced that it had completed the assembly of the industry's first commercial high numerical aperture (NA) extreme ultraviolet (EUV) lithography at its research and ...
TimesMachine is an exclusive benefit for home delivery and digital subscribers. About the Archive This is a digitized version of an article from The Times’s print archive, before the start of online ...
In this section, the manufacturing requirements associated with advanced semiconductor lithography are discussed. This is followed by a discussion of lithographic approaches being used or being ...
MELVILLE, N.Y., April 8, 2021 /PRNewswire/ — Canon U.S.A., Inc., a leader in digital imaging solutions, today announced that its parent company, Canon Inc., has launched the FPA-5520iV LF Option for ...
SANTA CLARA, Calif., March 14, 2023 /PRNewswire/ -- Picarro Inc., a leading provider of chemical metrology systems for advanced semiconductor fabs, today announced the SLiM 100 Lithography Process ...
Soft lithography facilitates the fabrication of intricate three-dimensional patterns and structures at both microscale and nanoscale dimensions. Diverging from photolithography, a technique commonly ...
TOKYO, Oct. 1, 2025 /PRNewswire/ -- Nikon Corporation is reaffirming the availability of its Digital Lithography System, DSP-100, with orders having commenced in July 2025. This system is specifically ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results