The MEGA coating system (multi-source magnetron sputtering system) enables the production of new types of metallic or ceramic coatings in monolithic, graded or multi-layer arrangements using 7 ...
Innovative RF-magnetron sputtering process creates homogenous BaTiO3 films for high-tech electronics
Microstructural characterization of BaTiO3 thin films prepared by RF-Magnetron sputtering using sintered targets from high energy ball milled powders The electronic and optical characteristics of ...
The confocal sputtering technique involves the arrangement of magnetrons inside a vacuum chamber so that it is possible to apply multiple materials onto the substrate without breaking vacuum. This ...
Targets of BaTiO 3 (BT) (50 mm diameter) were prepared starting from BT-commercial powders (99.9%) and particle size of 2 µm, previously dry milled by high energy process (SPEX 8000 mixer mill). The ...
The planar magnetron is a typical diode mode sputtering cathode consisting of a permanent magnet array behind it. This magnet array is organized in such a fashion to provide a magnetic field that is ...
Dublin, July 15, 2025 (GLOBE NEWSWIRE) -- The "Magnetron Sputter Film Market Outlook 2025-2034: Market Share, and Growth Analysis By Product Type (Metal Films, Alloy Films, Dielectric Films), By ...
Let us help you with your inquiries, brochures and pricing requirements Request A Quote Download PDF Copy Download Brochure The MS2 63C1 Magnetron Source available ...
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