What role does the reticle stage play in High NA extreme ultraviolet (EUV) lithography? In this video, learn how the reticle stage enables patterning in advanced chipmaking. You’ll see how 13.5 nanometer EUV light reflected into the system gets shaped by the illuminator and how a chip pattern gets encoded into the light for lithography. | ASML

The Most Complex Machine: EUV Lithography Systems Redefine Moore’s Law In the race to advance technology, one machine stands as a pinnacle of engineering marvel: the Extreme Ultraviolet (EUV) lithography system. Designed to etch the finest circuit patterns onto silicon wafers, this groundbreaking tool employs light with a wavelength of just 13.5 nanometers—smaller than a virus particle. The shift to such radically shorter wavelengths has unlocked the ability to create chips with transistor featu