8.4K views · 412 reactions | 【消息快報ASML第100台EUV完成出貨！朗】​ ​ Pushing...
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8.4K views · 412 reactions | 【消息快報ASML第100台EUV完成出貨！朗】​ ​ Pushing...
【消息快報 ASML第100台EUV完成出貨！朗】 Pushing technology beyond its limits! 在上週四，ASML第100台EUV極紫外光微影設備從荷蘭Veldhoven工廠端順利出貨！ ...
8.4K views3 weeks ago
ASML EUV Technology
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EUV lithography optics from ZEISS
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5.2K views · 113 reactions | At ASML San Diego — the global Center of Excellence for EUV light source development — engineers, scientists, and innovators work together to create the technology that powers the world's most advanced chips. From intercepting tin droplets with lasers to solving challenges that haven’t been defined yet — this is where the EUV light source truly comes to life. | ASML | Facebook
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＼ASML Tech｜なぜHigh-NA EUVで高い生産性を実現できる？／ 半導体技術はトランジスタをより小さく、より多くのトランジスタをシリコンウェハに集積する過程で進歩してきました。多くの機能と性能を盛り込んだ半導体チップを大量生産することで、手頃な価格で半導体チップを提供できるようになったのです。 ASMLでは、8ナノメートルの高精細のパターンを描けるHigh-NAのEUVリソグラフィシステム「TWINSCAN EXE:5000」を提供。このEXEシステムは、高速で稼働するステージが搭載されていて、高い生産性を実現しています。 【ポイント】 ✅アナモルフィック光学系により、露光フィールドのサイズは従来のNXEシステムの半分に。 ✅フィールドが半分になったため、理論的には1枚のウェハのパターンには2倍の時間がかかることになる。 ✅EXEシステムのレチクルステージはNXEの4倍の速度（32g）で加速することでこの問題を回避。 ✅EXEは1時間あたり185枚以上のウェハを露光可能。2025年には1時間あたり220枚を目指している。 👇詳しくはこちら｜High-NA EUVの5つの特
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在ASML下一代的高數值孔徑EUV設備 (High-NA EUV system) 中，反射鏡的技術已發展至登峰造極：如果將設備中的一面反射鏡想像成地球的大小，那麼鏡面上最大的誤差就只有人類頭髮那麼小！讓我們向創造如此工藝極限的合作夥伴 ZEISS Semiconductor Manufacturing Technology 致敬🌟 #ASML #EUV #ZEISS | ASML
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在ASML下一代的高數值孔徑EUV設備 (High-NA EUV system) 中，反射鏡 …
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